Improved photoelectrochemical responses of Si and Ti codoped α-Fe2O3 photoanode films

被引:115
作者
Zhang, Minglong [1 ,2 ,3 ]
Luo, Wenjun [1 ,2 ]
Li, Zhaosheng [1 ,2 ]
Yu, Tao [2 ]
Zou, Zhigang [2 ]
机构
[1] Nanjing Univ, Dept Mat Sci & Engn, Nanjing 210093, Peoples R China
[2] Nanjing Univ, Natl Lab Solid Microstruct, Ecomat & Renewable Energy Res Ctr, Nanjing 210093, Peoples R China
[3] Xuzhou AF Coll, Dept Airfield, Xuzhou 221000, Peoples R China
基金
中国国家自然科学基金;
关键词
doping; elemental semiconductors; iron compounds; photoelectrochemical cells; photoelectrochemistry; pyrolysis; silicon; thin films; titanium; SOLAR HYDROGEN-PRODUCTION; WATER; HEMATITE; PERFORMANCE; ELECTRODES;
D O I
10.1063/1.3470109
中图分类号
O59 [应用物理学];
学科分类号
摘要
We studied photoelectrochemical performance of the undoped, Si-doped, Ti-doped, and codoped alpha-Fe2O3 film prepared by ultrasonic spray pyrolysis. Since the ions radius of Si4+<Fe3+<Ti4+, Si and Ti codoping can balance the ion radius difference between Fe3+ and Si4+ (or Ti4+) and increase the donor concentration. Their donor concentrations, calculated from slopes of the Mott-Schottky plots, are 9.10 x 10(18) cm(-3), 1.89 x 10(20) cm(-3), 2.04 x 10(20) cm(-3), and 7.06 x 10(20) cm(-3), respectively. Incident photon to current efficiency of the codoped film is 34% at 365 nm and 0.6 V versus Ag/AgCl, much higher than 10%, 20%, and 22% for the undoped, Si-doped, and Ti-doped film, respectively. (C) 2010 American Institute of Physics. [doi:10.1063/1.3470109]
引用
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页数:3
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