MBE growth of para-hexaphenyl on GaAs(001)-2x4

被引:42
作者
Müller, B
Kuhlmann, T
Lischka, K
Schwer, H
Resel, R
Leising, G
机构
[1] Univ GH Paderborn, Fachbereich Phys, D-33095 Paderborn, Germany
[2] ETH Zurich, Inst Quantenelektron, CH-8093 Zurich, Switzerland
[3] ETH Zurich, Festkorperphys Lab, CH-8093 Zurich, Switzerland
[4] Graz Tech Univ, Inst Festkorperphys, A-8010 Graz, Austria
关键词
atomic force microscopy; gallium arsenide; hexaphenyl; molecular beam epitaxy; surface morphology; nucleation;
D O I
10.1016/S0039-6028(98)00720-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The morphology of para-hexaphenyl (PHP) grown on GaAs(001) by molecular beam epitaxy has been studied using atomic force microscopy (AFM). For elevated substrate temperatures between 90 and 170 degrees C and a deposition rate of 0.7 Angstrom s(-1), it was found that hexaphenyl on GaAs(001)-2 x 4 forms well-defined, three-dimensional islands of a rectangular shape oriented in [100]. Their constant width indicates that PHP is epitaxially grown as a coherently strained organic material. The island density shows the Arrhenius behavior resulting in activation barrier of (0.90+/-0.04) eV. The normalized island size distributions closely resemble that of a critical island size of one. On the basis of the AFM measurements, X-ray diffraction data, and geometrical considerations, we developed a structural model for PHP grown on GaAs(001). (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:256 / 266
页数:11
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