Electrolytic deposition of ZrO2-Y2O3 films

被引：37

作者：

Zhitomirsky, I ^{[1
]}

Petric, A ^{[1
]}

机构：

[1] McMaster Univ, Dept Mat Sci & Engn, Hamilton, ON L8S 4L7, Canada

来源：

MATERIALS LETTERS | 2001年 / 50卷 / 04期

关键词：

electrolytic deposition; yttria-stabilized zirconia; film; hydroxide; oxide; cathodic deposit;

D O I：

10.1016/S0167-577X(01)00223-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Cathodic electrodeposition of pure zirconia and yttria-doped zirconia films was performed by means of hydrolysis of ZrOCl2 and YCl3 salts dissolved in mixed ethyl alcohol-water solvent. The deposits were characterized by X-ray diffraction, thermogravimetric analysis and inductively coupled plasma spectroscopy. By varying the Y/Zr atomic ratio in solutions and deposition time, the amount of the deposited material and its composition could be controlled. Deposits as obtained were amorphous. The crystallization behavior of the deposits was studied as a function of temperature. A possible mechanism of electrodeposition is discussed. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：189 / 193

页数：5

共 33 条

[1]

[Anonymous], 1948, THEORY STABILITY LYO

[2] In situ reflection high energy electron bombardment analysis of biaxially oriented yttria-stabilized zirconia thin film growth on amorphous substrates [J].