Properties of Cr(C,N) hard coatings deposited in Ar-C2H2-N2 plasma

被引：50

作者：

Cekada, M

Macek, M

Merl, DK

Panjan, P

机构：

[1] Jozef Stefan Inst, Ljubljana 1000, Slovenia

[2] Univ Ljubljana, Fac Elect Engn, Ljubljana 1000, Slovenia

来源：

THIN SOLID FILMS | 2003年 / 433卷 / 1-2期

关键词：

hard coatings; high temperature oxidation; ion-plating; sputtering; evaporation;

D O I：

10.1016/S0040-6090(03)00328-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Several chromium carbonitride (Cr-(C,N)) coatings were prepared with different C:N ratios by varying the N-2 and C2H2 flow. Chromium nitride (Cr-N) and chromium carbide (Cr-C) coatings were also prepared for comparison. The coatings were deposited in two different ion-plating systems: by reactive evaporation in BAI730M (Balzers) apparatus at high temperature (450 degreesC) and by reactive sputtering in plasma-beam Sputron (Balzers) apparatus at low temperature (200 degreesC). Among mechanical properties microhardness, adhesion (measured by scratch test) and surface roughness were evaluated. Oxidation of the coatings was carried out by heating the samples at temperatures of 750-900 degreesC in an oxygen atmosphere. Crystal structure and microstructure were studied by XRD, TEM and SEM. Chemical State of the elements was observed by XPS. The concentration and depth profiles of the samples oxidized at various temperatures were measured by AES, EDX and GDOES. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：174 / 179

页数：6

共 22 条

[1] Microstructure, stress and mechanical properties of arc-evaporated Cr-C-N coatings [J].