Improvements and recent advances in nanocomposite capacitors using a colloidal technique

被引:41
作者
Agarwal, V [1 ]
Chahal, P [1 ]
Tummala, RR [1 ]
Allen, MG [1 ]
机构
[1] Georgia Inst Technol, Atlanta, GA 30332 USA
来源
48TH ELECTRONIC COMPONENTS & TECHNOLOGY CONFERENCE - 1998 PROCEEDINGS | 1998年
关键词
colloidal; embedded; integrated; nanocomposite; capacitor; thin-film; large-area substrate; meniscus coating;
D O I
10.1109/ECTC.1998.678687
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, a colloidal technique is used to improve the dielectric properties of nanocomposite materials and to achieve thin film deposition (< 5 mu m) on large area substrates using meniscus coating. Using this technique, improved particle dispersion is achieved, which in turn allows for higher volume loading (increased dielectric constant), small variation of dielectric constant across the substrate, and thin-film deposition with lower particle-induced defects. Appropriate dispersants and fillers particularly applicable to meniscus coating of these composite materials were found which allowed the coated and cured composite material to attain high relative dielectric constant (typical 40). Non-meniscus-coated samples with dielectric constants as high as 74 were achieved by varying the particle size distribution.
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页码:165 / 170
页数:6
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