Electrochemical and XPS studies of the passivation behavior of sputter-deposited Cr-Ta alloys in 12 M HCl

被引：14

作者：

Li, XY ^{[1
]}

Akiyama, E ^{[1
]}

Habazaki, H ^{[1
]}

Kawashima, A ^{[1
]}

Asami, K ^{[1
]}

Hashimoto, K ^{[1
]}

机构：

[1] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan

来源：

CORROSION SCIENCE | 1998年 / 40卷 / 09期

关键词：

alloy; sputtered films; polarization; XPS; passive films;

D O I：

10.1016/S0010-938X(98)00070-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The sputter-deposited Cr-Ta alloys show extremely high corrosion resistance in 12M HCl. The open circuit potentials of the Cr-Ta alloys are located in the passive regions of both chromium and tantalum, and all Cr-Ta alloys are spontaneously passivated. XPS analysis indicates that the composition and thickness of the air-formed film are the same as those of spontaneously passivated film, and the composition of the passive films becomes constant after prolonged immersion. The film consists of a double oxyhydroxide of chromium and tantalum cations. The formation of the homogeneous double oxyhydroxide film consisting of both chromium and tantalum cations by air oxidation is responsible for the extremely high corrosion resistance of the Cr-Ta alloys in comparison with the corrosion resistance of chromium and tantalum metals. (C) 1998 Elsevier Science Ltd. Ali rights reserved.

引用

页码：1587 / 1604

页数：18

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