Mechanism of the dissociation of chlorofluorocarbons during nonthermal plasma processing in nitrogen at atmospheric pressure

被引：23

作者：

Gal', A ^{[1
]}

Ogata, A ^{[1
]}

Futamura, S ^{[1
]}

Mizuno, K ^{[1
]}

机构：

[1] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058569, Japan

来源：

JOURNAL OF PHYSICAL CHEMISTRY A | 2003年 / 107卷 / 42期

关键词：

D O I：

10.1021/jp0347769

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We investigated the chemical transformation of low concentrations (similar to100 ppm) of chlorofluorocarbons (CFCs) in gaseous nitrogen by nonthermal plasma processing by assuming that this transformation occurs by the dominant mechanism of CFC dissociation. The calculated and experimental results indicate that the extent of CFC dissociation induced by energy transfer from electronically excited species is negligible. We suggest that dissociation by impact with high-energy plasma electrons is the process mainly responsible for the decomposition of CFC. We also discuss the possibility of optimizing this plasma process for environmental engineering in the semiconductor industry.

引用

页码：8859 / 8866

页数：8

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