Effects of stacking fault defects on the X-ray diffraction patterns of T2, O2, and O6 structure Li2/3[CoxNi1/3-xMn2/3]O2

被引:47
作者
Lu, ZH
Dahn, JR [1 ]
机构
[1] Dalhousie Univ, Dept Phys, Halifax, NS B3H 3J5, Canada
[2] Dalhousie Univ, Dept Chem, Halifax, NS B3H 3J5, Canada
关键词
D O I
10.1021/cm000885d
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
During the preparation of Li-2/3[CoxNi1/3-xMn2/3]O-2 from Na-2/3[CoxNi1/3-xMn2/3]O-2 by low-temperature ion exchange, the MO2 sheets slide so the alkali coordination can change from prismatic in the Na compound to octahedral or tetrahedral in the Li compound. All Li-containing samples show stacking faults, some with very high densities of faults, based on broad mixed index peaks in their diffraction patterns. Here, we calculate simulated diffraction patterns using the DIFFaX program developed by Treacy ct al. We have considered intergrowths of the T2 and O2 structures and stacking faults in both O2 and O6 structures and have compared the results with experimental X-ray diffraction patterns of Li-2/3[CoxNi1/3-xMn2/3]O-2 (x = 0, (1)/(24), and (1)/(12)). The stacking fault models are consistent with the experimental data. Furthermore, we suggest that Li-2/3[CoxNi1/3-xMn2/3]O-2 (x = 1/12) is actually a stacking faulted O6 structure, not a stacking faulted O2 structure as we claimed previously.
引用
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页码:2078 / 2083
页数:6
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