Using porous silicon as semi-insulating substrate for β-SiC high temperature optical-sensing devices

被引:20
作者
Hsieh, WT
Fang, YK
Wu, KH
Lee, WJ
Ho, JJ
Ho, CW
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, VLSI Technol Lab, Inst Microelect, Tainan 70101, Taiwan
[2] So Taiwan Univ Technol, Dept Elect Engn, Tainan, Taiwan
[3] Fortune Inst Technol, Dept Elect Engn, Kaohsiung, Taiwan
关键词
metal-semiconductor-metal; OEIC; porous silicon; semi-insulating substrate; silicon carbide;
D O I
10.1109/16.915729
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This work demonstrates the availability of using porous silicon as semi-insulating substrate for beta -SiC high temperature optical sensing devices. A h ISM structure was fabricated both on porous silicon substrate and conventional silicon substrate, respectively. Experimental results show the optical current ratio can he improved up to 400% at room temperature and 3000% at 200 degreesC operating temperature, respectively, with the porous silicon substrate.
引用
收藏
页码:801 / 803
页数:3
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