The effect of annealing on the electrochromic properties of microcrystalline NiOx films prepared by reactive magnetron rf sputtering

被引：43

作者：

Jiang, SR ^{[1
]}

Feng, BX ^{[1
]}

Yan, PX ^{[1
]}

Cai, XM ^{[1
]}

Lu, SY ^{[1
]}

机构：

[1] Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 2001年 / 174卷 / 02期

基金：

中国国家自然科学基金;

关键词：

NiOx films; annealing; electrochromic properties;

D O I：

10.1016/S0169-4332(01)00022-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The effect of annealing on the electrochromic (EC) properties of nickel oxide (NiOx, x > 1) films prepared by reactive rf sputtering is studied with electrochemical measurements, optical transmittance analysis, scanning tunneling microscope (STM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). Research results show that EC properties of NiOx films can be changed greatly by annealing. The mechanism for the change of electrochromic properties was discussed in details. (C) 2001 Published by Elsevier Science B.V.

引用

页码：125 / 131

页数：7

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