机构:
TECSTAR, ASD, City Of Industry, CA 91745 USATECSTAR, ASD, City Of Industry, CA 91745 USA
Chu, C
[1
]
机构:
[1] TECSTAR, ASD, City Of Industry, CA 91745 USA
来源:
CONFERENCE RECORD OF THE TWENTY-EIGHTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE - 2000
|
2000年
关键词:
D O I:
10.1109/PVSC.2000.916116
中图分类号:
TE [石油、天然气工业];
TK [能源与动力工程];
学科分类号:
0807 ;
0820 ;
摘要:
Large size Si substrates coated with a thin layer of single crystal Ge were used to grow GaAs and GaInP2 solar cells using MOCVD. Preliminary evaluation indicated (1) both GaAs and GaInP2 were highly crystalline epi-layers, (2) quantum efficiency of GaInP2 cell on Si substrate can reach 94% of high quality GaInP2 on Ge substrate and that of GaAs cell on Si substrate can reach 83.4%, and (3) a 5000 thermal cycle test of temperature range from +170 degreesC to -100 degreesC did not damage the solar cell. These results showed that a properly prepared Ge layer on Si can relax strain and grow a high quality GaInP2 and GaAs solar cell, with a practical efficiency for space application.