GaInP2 and GaAs solar cells grown on Si substrate

被引:3
作者
Chu, C [1 ]
机构
[1] TECSTAR, ASD, City Of Industry, CA 91745 USA
来源
CONFERENCE RECORD OF THE TWENTY-EIGHTH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE - 2000 | 2000年
关键词
D O I
10.1109/PVSC.2000.916116
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Large size Si substrates coated with a thin layer of single crystal Ge were used to grow GaAs and GaInP2 solar cells using MOCVD. Preliminary evaluation indicated (1) both GaAs and GaInP2 were highly crystalline epi-layers, (2) quantum efficiency of GaInP2 cell on Si substrate can reach 94% of high quality GaInP2 on Ge substrate and that of GaAs cell on Si substrate can reach 83.4%, and (3) a 5000 thermal cycle test of temperature range from +170 degreesC to -100 degreesC did not damage the solar cell. These results showed that a properly prepared Ge layer on Si can relax strain and grow a high quality GaInP2 and GaAs solar cell, with a practical efficiency for space application.
引用
收藏
页码:1250 / 1252
页数:3
相关论文
共 2 条
[1]  
SOGA T, J APPL PHYS, V87, P2285
[2]  
WANG G, APPL PHYS LETT, V76, P730