Study of surface charge effects on oxide and nitride planarization using alumina/ceria mixed abrasive slurries

被引：25

作者：

Hegdea, S ^{[1
]}

Babu, SV

机构：

[1] Clarkson Univ, Dept Chem Engn, Potsdam, NY 13699 USA

[2] Clarkson Univ, Ctr Adv Mat Proc, Potsdam, NY 13699 USA

来源：

ELECTROCHEMICAL AND SOLID STATE LETTERS | 2004年 / 7卷 / 12期

关键词：

D O I：

10.1149/1.1813231

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 [应用化学];

摘要：

The effect of surface charges on oxide and nitride film polishing was investigated using alumina/ceria mixed abrasive slurries. It was found that the surface charges on both the abrasives and the oxide and nitride blanket films being polished play a significant role in determining the polish rates. The polish rates increase when the surface films being polished and the abrasives are oppositely charged and decrease when they have the same charge. It was also established that the oxide/nitride film polish rates are higher with increasing hardness of the core alumina particles in the mixed slurry. (C) 2004 The Electrochemical Society.

引用

页码：G316 / G318

页数：3

共 19 条

[1]

BABU SV, 1999, CHEM MECH POLISHING

[2]

BRYANT A, 1994, INTERNATIONAL ELECTRON DEVICES MEETING 1994 - IEDM TECHNICAL DIGEST, P671, DOI 10.1109/IEDM.1994.383292

[3]

EFFECTS OF SOXHLET EXTRACTION ON THE SURFACE OXIDE LAYER OF SILICON-NITRIDE POWDERS [J].