Study of CdTe etching process in alcoholic solutions of bromine

被引:35
作者
Kotina, IM [1 ]
Tukhkonen, LM
Patsekina, GV
Shchukarev, AV
Gusinskii, GM
机构
[1] St Petersburg Nucl Phys Inst, Gatchina 188350, Russia
[2] Mekhanobr Analyt, St Petersburg, Russia
[3] AF Ioffe Physicotech Inst, St Petersburg 194021, Russia
关键词
D O I
10.1088/0268-1242/13/8/011
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Changes in the structure and stoichiometry of the p-CdTe surface as a result of etching have been studied by high-resolution x-ray photoelectron spectroscopy and the Rutherford backscattering method. Etching with bromine-methanol and bromine-butanol solutions is shown to enrich the surface with elementary tellurium (Te-0). The etching process is anisotropic, in particular, the extent of enrichment with Te-0 is not the same for A and B surfaces. Arguments are developed in favour of the heterophase nature of the etched surface. The presence of water in the etches leads to Te-0 oxidation in the course of etching. The mechanism of etching is discussed based on the data obtained.
引用
收藏
页码:890 / 894
页数:5
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