Studying density vs. Ar-pressures for optimization of DC-magnetron sputter deposition of Ni/C multilayers for hard X-ray telescopes

被引：1

作者：

Hussain, AM

Romaine, S

Gorenstein, P

Everett, J

Bruni, R

Clark, A

Ruane, M

Fedyunin, Y

机构：

来源：

GRAZING INCIDENCE AND MULTILAYER X-RAY OPTICAL SYSTEMS | 1997年 / 3113卷

关键词：

DC-magnetron sputtering; X-ray Telescopes; multilayers; X-ray reflection measurements; AFM-measurements; Ar-pressure; Density; TEM-measurements;

D O I：

10.1117/12.278855

中图分类号：

P1 [天文学];

学科分类号：

0704 ;

摘要：

The influence of varying the Ar-pressure in the process of depositing Ni/C multilayers by DC-magnetron sputtering has been studied, and Atomic Force Microscopy (AFM) measurements, X-ray characterization results and Transmission Electron Microscopy (TEM) results are presented. Single Ni and C films and Ni/C multilayers were deposited at Ar-pressures of 1.5, 3, 5 and 7 mTorr. The one-dimensional power spectral density data from the AFM measurements clearly indicate that the best densities and film qualities for both materials are obtained at lower Ar-pressures, i.e. 1.5 mTorr.

引用

页码：260 / 266

页数：7