High-frequency electron beam modulation in a diode with an active plasma cathode

被引：9

作者：

Krasik, YE ^{[1
]}

Dunaevsky, A ^{[1
]}

Felsteiner, J ^{[1
]}

机构：

[1] Technion Israel Inst Technol, Dept Phys, IL-32000 Haifa, Israel

来源：

APPLIED PHYSICS LETTERS | 1998年 / 73卷 / 04期

关键词：

D O I：

10.1063/1.121897

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have carried out experiments with an active plasma cathode showing the possibility to generate a modulated electron beam with a repetition rate of 2 Hz without the use of a high-frequency power supply. The modulation of the beam current amplitude reaches values greater than or equal to 30%. This modulation is found to have a frequency of 325 +/- 5 MHz for a discharge capacitor of 1 nF and a duration greater than or equal to 1 mu s. In addition, the modulated electron beam is accompanied by electromagnetic radiation with the same frequency. We suggest that this high-frequency modulation is caused by electron oscillations within the potential well which is created inside the cathode structure by the positive potential of the plasma. (C) 1998 American Institute of Physics.

引用

页码：453 / 455

页数：3