Optical properties of Stranski-Krastanov grown three-dimensional Si/Si1-xGx nanostructures

被引:14
作者
Kamenev, BV
Baribeau, JM
Lockwood, DJ
Tsybeskov, L
机构
[1] New Jersey Inst Technol, Dept Elect & Comp Engn, Newark, NJ 07102 USA
[2] Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada
关键词
SiGe; nanocrystals; dots; photoluminescence; Raman scattering;
D O I
10.1016/j.physe.2004.08.047
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Detailed Raman and photoluminescence (PL) measurements are reported for Si/Si1-xGex nanostructures grown by molecular beam epitaxy under near Stranski-Krastanov (S-K) growth mode conditions. In samples with x ranging from 0.096 to 0.53, we observe that an increase in the Raman signal related to Ge-Ge vibrations correlates with (i) a red shift in the PL peak position, (ii) an increase in the activation energy of PL thermal quenching, and (iii) an increase in the PL quantum efficiency. The results indicate that for x > 0. 5 Ge atoms form nanometer size clusters with a nearly pure Ge core surrounded by a SiGe shell. Time-resolved PL measurements reveal a stretched-exponential long-lived PL component that is associated with compositional and dimensional fluctuations in the SiGe dots. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:174 / 179
页数:6
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