Substrate-Dependant Ability of Titanium(IV) Oxide Photocatalytic Thin Films Prepared by Thermal CVD to Generate Hydrogen Gas from a Sacrificial Reaction

被引：9

作者：

Hyett, Geoffrey ^{[1
]}

Darr, Jawwad A. ^{[1
]}

Mills, Andrew ^{[2
]}

Parkin, Ivan P. ^{[1
]}

机构：

[1] UCL, Christopher Ingold Lab, London WC1H 0AJ, England

[2] Univ Strathclyde, Dept Pure & Appl Chem, Glasgow G1 1XL, Lanark, Scotland

来源：

CHEMICAL VAPOR DEPOSITION | 2010年 / 16卷 / 10-12期

基金：

英国工程与自然科学研究理事会;

关键词：

CHEMICAL-VAPOR-DEPOSITION; SEMICONDUCTOR PHOTOCATALYSIS; WATER-PURIFICATION; COATINGS; TIO2; PHOTOLYSIS; DIOXIDE; ANATASE; GLASS;

D O I：

10.1002/cvde.201004298

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

We report the observation of hydrogen production from photodiodes, when irradiated with UV light. These photodiodes were composed of a stainless steel substrate, with a TiO(2) photocatalyst deposited suing APCVD on one side and Pt deposited using sputter coating on the other. In contrast similar devices made using a titanium substrate show no measurable H(2) production.

引用

页码：301 / 304

页数：4

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