Direct writing of metallic nanostructures by means of metal colloids

被引：4

作者：

Dumpich, G ^{[1
]}

Lohau, J

Wassermann, EF

Winter, M

Reetz, MT

机构：

[1] Gerhard Mercator Univ GH Duisburg, Lab Tieftemp Phys, D-47048 Duisburg, Germany

[2] Max Planck Inst Kohlenforsch, D-45470 Mulheim, Germany

来源：

TRENDS AND NEW APPLICATIONS OF THIN FILMS | 1998年 / 287-2卷

关键词：

electron-beam lithography; direct writing; nanostructure; colloid; organometallic precursor;

D O I：

10.4028/www.scientific.net/MSF.287-288.413

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report on an easy to handle method of fabricating metallic nanostructures by electron-beam lithography (EBL) with surfactant stabilized metal colloids. Colloid films are directly patterned by destroying their organic stabilizers with high energy electron beams. This allows to produce metal nanostructures of various kinds of material and of any geometry without the need for metal deposition- and lift-off-procedures.

引用

页码：413 / 415

页数：3

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