An investigation of vapor deposited boron rich carbon -: a novel graphite-like material -: part I:: the structure of BCx (C6B) thin films

被引:65
作者
Hach, CT
Jones, LE [1 ]
Crossland, C
Thrower, PA
机构
[1] Alfred Univ, New York State Coll Ceram, Alfred, NY 14802 USA
[2] Penn State Univ, University Pk, PA 16802 USA
关键词
carbon films; graphitization; chemical vapor deposition; X-ray diffraction; TEM;
D O I
10.1016/S0008-6223(98)00166-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A black reflective solid containing boron and carbon was produced via chemical vapor deposition (CVD) at 700 degrees C. The boron concentration in these films was determined to be 17 at.%. X-ray diffraction has shown the interlayer spacing of this novel compound to be similar to that of graphite (d(002) = 0.3384 nm). Identification of 001 and hk0 reflections have also been made using electron diffraction. The BCx films have a microstructure consisting of regions of textured hexagonal platelets with a diameter (L-a) of similar to 25 nm. BCx has no ABAB layer plane registration. This material is identified as pseudo-hexagonal due to the lack of hkl reflections. Modeling of boron rich carbon was undertaken in order to define the nature of defects in these solids, This solid structure is more accurately defined by the stoichiometry -C6B. (C) 1999 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:221 / 230
页数:10
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