C:N and C:N:O films: Preparation and properties

被引：24

作者：

Vorlicek, V

Siroky, P

Sobota, J

Perina, V

Zelezny, V

Hrdina, J

机构：

[1] HVM PLASMA LTD,CR-27741 TUHAN,CZECH REPUBLIC

[2] ACAD SCI CZECH REPUBL,INST SCI INSTRUMENTS,CR-61264 BRNO,CZECH REPUBLIC

[3] ACAD SCI CZECH REPUBL,INST NUCL PHYS,CR-25068 PRAGUE,CZECH REPUBLIC

来源：

DIAMOND AND RELATED MATERIALS | 1996年 / 5卷 / 3-5期

关键词：

carbon; sputtering; Raman spectra; adhesion;

D O I：

10.1016/0925-9635(95)00366-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Oxygen pressure and bias voltage affect the mechanical and optical behaviour of r.f magnetron sputtered C:N films in different ways. At higher oxygen pressures, hydrogen is also incorporated. The adhesion of the film is improved when a suitable metallic buffer layer is deposited prior to carbon coating.

引用

收藏

页码：570 / 574

页数：5

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