Local morphology and correlation lengths of reactive NiO/Cu(111) interfaces

被引：7

作者：

Barbier, A ^{[1
]}

Stanescu, S

Boeglin, C

Deville, JP

机构：

[1] CEA Saclay, DRECAM, SPCSI, F-91191 Gif Sur Yvette, France

[2] IPCMS, GSI, F-67034 Strasbourg 2, France

来源：

PHYSICAL REVIEW B | 2003年 / 68卷 / 24期

关键词：

D O I：

10.1103/PhysRevB.68.245418

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A combined experimental near-field and reciprocal space analysis was used to quantitatively characterize the complex reactive interaction between a NiO vapor phase and the stable Cu(111) surface. The results are discussed within a pair potential energetics model. It is shown that the incorporation of Ni in the substrate in the early stages of growth leads to a well-defined almost monodispersed assembly of holes (48 Angstrom in diameter). The Ni-rich corrals along the hole edges act as a template for the subsequent (>4 Angstrom NiO) growth of NiO islands showing a well-defined correlation length of again 48 Angstrom.

引用

页数：7

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