NANO-motheye antireflection pattern by plasma treatment of polymers

被引：118

作者：

Kaless, A ^{[1
]}

Schulz, U ^{[1
]}

Munzert, P ^{[1
]}

Kaiser, N ^{[1
]}

机构：

[1] Fraunhofer Inst Appl Opt & Precis Engn, D-07745 Jena, Germany

来源：

SURFACE & COATINGS TECHNOLOGY | 2005年 / 200卷 / 1-4期

关键词：

roughness; ion bombardment; polymers; nanostructure;

D O I：

10.1016/j.surfcoat.2005.01.067

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The application of plasma treatment on transparent PMMA substrates has shown an effect of reducing surface reflection. This effect is based on a refractive index gradient created by a combination of chemical decomposition and physical etching on the polymer surface. A stochastic nanostructure was found by means of AFM and SEM. Conditions for the plasma treatment process and properties of the modified PMMA surfaces have been discussed. (c) 2005 Elsevier B.V All rights reserved.

引用

页码：58 / 61

页数：4

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