Contrast reversal in scanning capacitance microscopy imaging

被引:55
作者
Stephenson, R
Verhulst, A
De Wolf, P
Caymax, M
Vandervorst, W
机构
[1] IMEC, B-3001 Heverlee, Belgium
[2] Katholieke Univ Leuven, INSYS, B-3001 Louvain, Belgium
关键词
D O I
10.1063/1.122517
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated the quantification properties of scanning capacitance microscopy (SCM) by using two dedicated test structures and highlight the response of SCM to changes in dopant density. Our results indicate that contrast reversal occurs and that the SCM output is not always a monotonically increasing signal with decreasing dopant density. Two epitaxially grown staircase structures covering the doping ranges 10(14)-10(20) cm(-3) p type and 5 x 10(14)-5 x 10(19) cm(-3) n type were produced for this study as the turning point in the response function typically occurs at a doping level of around 10(17) cm(-3). Through the use of a simple simulation model we see that contrast reversal is expected due to a relative shift between the dC/dV curves for different doping levels. The onset of contrast reversal can be adjusted by changing the dc sample bias leading to a shift in the operating position of the SCM, and the significance of this point will be discussed here. (C) 1998 American Institute of Physics. [S0003-6951(98)03844-3].
引用
收藏
页码:2597 / 2599
页数:3
相关论文
共 11 条
[1]   Atomic force microscope tip-induced local oxidation of silicon: Kinetics, mechanism, and nanofabrication [J].
Avouris, P ;
Hertel, T ;
Martel, R .
APPLIED PHYSICS LETTERS, 1997, 71 (02) :285-287
[2]   Epitaxial staircase structure for the calibration of electrical characterization techniques [J].
Clarysse, T ;
Caymax, M ;
De Wolf, P ;
Trenkler, T ;
Vandervorst, W ;
McMurray, JS ;
Kim, J ;
Williams, CC ;
Clark, JG ;
Neubauer, G .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (01) :394-400
[3]   MAPPING OF MOBILE CHARGES ON INSULATOR SURFACES WITH THE ELECTROSTATIC FORCE MICROSCOPE [J].
DOMANSKY, K ;
LENG, Y ;
WILLIAMS, CC ;
JANATA, J ;
PETELENZ, D .
APPLIED PHYSICS LETTERS, 1993, 63 (11) :1513-1515
[4]   Scanning capacitance spectroscopy: An analytical technique for pn-junction delineation in Si devices [J].
Edwards, H ;
McGlothlin, R ;
San Martin, R ;
U, E ;
Gribelyuk, M ;
Mahaffy, R ;
Shih, CK ;
List, RS ;
Ukraintsev, VA .
APPLIED PHYSICS LETTERS, 1998, 72 (06) :698-700
[5]   Two-dimensional imaging of charge carrier profiles using local metal-semiconductor capacitance-voltage measurement [J].
Li, Y ;
Nxumalo, JN ;
Thomson, DJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (01) :457-462
[6]   Model database for determining dopant profiles from scanning capacitance microscope measurements [J].
Marchiando, JF ;
Kopanski, JJ ;
Lowney, JR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (01) :463-470
[7]   Quantitative measurement of two-dimensional dopant profile by cross-sectional scanning capacitance microscopy [J].
McMurray, JS ;
Kim, J ;
Williams, CC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (04) :1011-1014
[8]   REPRODUCIBLE AND CONTROLLABLE CONTACT ELECTRIFICATION ON A THIN INSULATOR [J].
MORITA, S ;
FUKANO, Y ;
UCHIHASHI, T ;
OKUSAKO, T ;
SUGAWARA, Y ;
YAMANISHI, Y ;
OASA, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1993, 32 (11B) :L1701-L1703
[9]  
UKRAINTSEV V, PREPRINT
[10]   LATERAL DOPANT PROFILING ON A 100 NM SCALE BY SCANNING CAPACITANCE MICROSCOPY [J].
WILLIAMS, CC ;
SLINKMAN, J ;
HOUGH, WP ;
WICKRAMASINGHE, HK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (02) :895-898