Modelling of cyclic voltammograms for two-step metal deposition on an inert electrode with adsorption

被引：18

作者：

Martinet, S ^{[1
]}

Bouteillon, J ^{[1
]}

Caire, JP ^{[1
]}

机构：

[1] Ecole Natl Super Electrochim & Electromet, Inst Natl Polytech Grenoble, Lab Electrochim & Physicochim Mat & Interfaces, UMR 5631 UJF, F-38402 St Martin Dheres, France

来源：

JOURNAL OF APPLIED ELECTROCHEMISTRY | 1998年 / 28卷 / 08期

关键词：

adsorption; experimental design; metal electrodeposition; modelling; voltammetry;

D O I：

10.1023/A:1003424123260

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Chromium deposition on an inert electrode is a complex process. To gain a better understanding of phenomena involved in multistep reactions we have studied such a mechanism and developed Voltasim, a new software that simulates cyclic voltammograms for a two-step metal deposition with adsorption. In addition, Voltasim is suitable for either reversible or quasi-reversible or irreversible reactions. The software was validated with experimental results obtained for the chromium deposition case. Data fitting was achieved using a screening design of experiments involving 12 parameters.

引用

页码：819 / 825

页数：7

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