Fabrication and characterization of anatase/rutile-TiO2 thin films by magnetron sputtering:: a review

被引：37

作者：

Tanemura, S ^{[1
]}

Miao, L

Wunderlich, W

Tanemura, M

Mori, Y

Toh, S

Kaneko, K

机构：

[1] Nagoya Inst Technol, Dept Environm Technol & Urban Planning, Showa Ku, Nagoya, Aichi 4668555, Japan

[2] NGK Insulators Ltd, Mat Res Lab, Mizuho Ku, Nagoya, Aichi 4678530, Japan

[3] Kyushu Univ, Dept Mat Sci & Engn, Higashi Ku, Fukuoka 8128581, Japan

[4] Kyushu Univ, HVEM Lab, Higashi Ku, Fukuoka 8128581, Japan

来源：

SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS | 2005年 / 6卷 / 01期

关键词：

TiO2 thin film; helicon RF magnetron sputtering; epitaxial growth; optical properties; bactericidal ability; surface treatment;

D O I：

10.1016/j.stam.2004.06.003

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This review article summarizes briefly some important achievements of our recent reserach on anatase and/or rutile TiO2 thin films, fabricated by helicon RF magnetron sputtering, with good crystal quality and high density, and gives the-state-of-the-art of the knowledge on systematic interrelationship for fabrication conditions, crystal structure, composition, optical properties, and bactericidal abilities, and on the effective surface treatment to improve the optical reactivity of the obtained films. (c) 2004 Elsevier Ltd. All rights reserved.

引用

页码：11 / 17

页数：7

共 36 条

[1] Atomic layer growth of epitaxial TiO2 thin films from TiCl4 and H2O on α-Al2O3 substrates [J].