Polymeric Sacrificial layers for the control of microstructure and porosity of oxide thin films deposited by plasma-enhanced chemical vapor deposition

被引：7

作者：

Barranco, A ^{[1
]}

Cotrino, J

Yubero, F

González-Elipe, AR

机构：

[1] Univ Seville, CSIC, Inst Ciencia Mat Sevilla, C Amer Vespucio S-N, Seville 41092, Spain

[2] Univ Seville, CSIC, Dept Quim Inorgan, Seville 41092, Spain

[3] Univ Seville, Fac Fis, Dept Fis Atom Mol & Nucl, Seville, Spain

来源：

CHEMISTRY OF MATERIALS | 2003年 / 15卷 / 16期

关键词：

Polymeric sacrificial layers;

D O I：

10.1021/cm034023z

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Scanning electron microscopy images of two porous thin films of similar thickness deposited by PECVD at room temperature and low pressure. The microstructure and porosity of the films were controlled using intermediate plasma polymer sacrificial layers during the deposition.

引用

页码：3041 / 3043

页数：3

共 9 条

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