Adsorption of acrylic acid on aluminium at 300K: A multi-spectroscopic study

被引：43

作者：

Bournel, F

Laffon, C

Parent, P

Tourillon, G

机构：

[1] LURE, Université Paris-Sud, Bâtiment 209D

来源：

SURFACE SCIENCE | 1996年 / 352卷

关键词：

acrylic acid; adsorption kinetics; aluminium; reflection absorption IR spectroscopy (RAIRS); metal - organic molecule interfaces; near edge X-ray absorption fine structure (NEXAFS); X-ray photoelectron spectroscopy;

D O I：

10.1016/0039-6028(95)01138-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The interface between acrylic acid (CH2=CH-COOH) and polycristalline aluminium at 300 K has been studied by different spectroscopies to determine the adsorption mechanism. X-ray photoemission spectroscopy (XPS) probed the occupied states (core levels) of the system, near edge X-ray absorption fine structure (NEXAFS) with synchrotron beam specified the unoccupied ones and reflection absorption infrared spectroscopy (RAIRS) measured the vibration modes of this interface. All the data clearly show that acrylic acid is dissociated upon adsorption on aluminium at 300 K, leading to the formation of saturated aliphatic chains directly linked to the metallic surface (C-Al bond) and of aluminium oxide islands onto which adsorption of aliphatic carboxylate occurs.

引用

页码：228 / 231

页数：4

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