Alcohol-assisted CVD of silver using commercially available precursors

被引:23
作者
Bahlawane, Naoufal
Premkumar, Peter Antony
Brechling, Armin
Reiss, Guenter
Kohse-Hoeinghaus, Katharina
机构
[1] Univ Bielefeld, Dept Chem, D-33615 Bielefeld, Germany
[2] Univ Bielefeld, Dept Phys, D-33615 Bielefeld, Germany
关键词
pulsed-spray-evaporation CVD; silver films; liquid delivery; metallization; electrical resistivity;
D O I
10.1002/cvde.200706610
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
A novel chemical approach was demonstrated for the growth of high-quality, silver films by CVD. This concept relies on the catalytic reactivity of cationic silver, and of silver surfaces with alcohols. This leads to high-purity films using either state-of-the-art precursors or silver salts that have not been yet considered as CVD precursors. The occurrence of the catalytic oxidative-dehvdrogenation of alcohols, considered as the driving force in this process, was shown by in-situ mass spectrometry (MS). Films of fcc-Ag with p <= 2 mu Omega cm were grown without any noticeable contamination. Ag(hfac)COD leads to the growth of a (111) highly orientated film on glass at a rate of 1.66 nm min(-1), while polycrystalline films are grown at a rate of 18.5 run min(-1) using AgNO3.
引用
收藏
页码:401 / 407
页数:7
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