Nanoporous thin films from self-assembled metallo-supramolecular block copolymers

被引:87
作者
Fustin, CA
Lohmeijer, BGG
Duwez, AS
Jonas, AM
Schuhert, US
Gohy, JF
机构
[1] Eindhoven Univ Technol, Lab Macromol Chem & Nanosci, NL-5600 MB Eindhoven, Netherlands
[2] Catholic Univ Louvain, Unite POLY & CeRMIN, B-1348 Louvain, Belgium
关键词
D O I
10.1002/adma.200402073
中图分类号
O6 [化学];
学科分类号
0703 [化学];
摘要
Nanoporous thin polymer films have been produced by a simple two-step approach using metallo-supramolecular block copolymers as the starting materials. The first step is the self-assembly of the copolymer, yielding cylindrical microdomains oriented normal to the substrate. The second step involves the opening of the metal-ligand complex located at the junction of the two blocks by redox chemistry to release the minor block and create the pores (see Figure).
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页码:1162 / +
页数:5
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