Defect evolution in ultrathin films of polystyrene-block-polymethylmethacrylate diblock copolymers observed by atomic force microscopy

被引：93

作者：

Hahm, J

Lopes, WA

Jaeger, HM

Sibener, SJ

机构：

[1] Univ Chicago, James Franck Inst, Dept Chem, Chicago, IL 60637 USA

[2] Univ Chicago, James Franck Inst, Dept Phys, Chicago, IL 60637 USA

来源：

JOURNAL OF CHEMICAL PHYSICS | 1998年 / 109卷 / 23期

关键词：

D O I：

10.1063/1.477702

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We track individual defects in the microdomain patterns of cylinder-forming polystyrene-block-polymethylmethacrylate films with atomic force microscopy to elucidate the evolution of diblock domain topology during annealing. This evolution takes place through relinking, joining, clustering, and annihilation of defects. Such processes form the basis for predicting structural change in polymer films. (C) 1998 American Institute of Physics. [S0021-9606(98)71047-5].

引用

收藏

页码：10111 / 10114

页数：4

相关论文

共 16 条

[1] OPTICAL CHARACTERIZATION OF ORDERING AND DISORDERING OF BLOCK COPOLYMER MICROSTRUCTURE [J].

AMUNDSON, K ;

HELFAND, E ;

PATEL, SS ;

QUAN, X ;

SMITH, SD .

MACROMOLECULES, 1992, 25 (07) :1935-1940

[2] ALIGNMENT OF LAMELLAR BLOCK-COPOLYMER MICROSTRUCTURE IN AN ELECTRIC-FIELD .2. MECHANISMS OF ALIGNMENT [J].

AMUNDSON, K ;

HELFAND, E ;

QUAN, XN ;

HUDSON, SD ;

SMITH, SD .

MACROMOLECULES, 1994, 27 (22) :6559-6570

[3] EFFECT OF AN ELECTRIC-FIELD ON BLOCK COPOLYMER MICROSTRUCTURE [J].

AMUNDSON, K ;

HELFAND, E ;

DAVIS, DD ;

QUAN, X ;

PATEL, SS ;

SMITH, SD .

MACROMOLECULES, 1991, 24 (24) :6546-6548

[4] ALIGNMENT OF LAMELLAR BLOCK-COPOLYMER MICROSTRUCTURE IN AN ELECTRIC-FIELD .1. ALIGNMENT KINETICS [J].

AMUNDSON, K ;

HELFAND, E ;

QUAN, X ;

SMITH, SD .

MACROMOLECULES, 1993, 26 (11) :2698-2703

[5] BLOCK COPOLYMER THERMODYNAMICS - THEORY AND EXPERIMENT [J].

BATES, FS ;

FREDRICKSON, GH .

ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 1990, 41 (01) :525-557

[6]

Chaikin P. M., 1995, PRINCIPLES CONDENSED

[7] Flow-induced alignment of lamellar block copolymer melts [J].

Chen, ZR ;

Kornfield, JA .

POLYMER, 1998, 39 (19) :4679-4699

[8] Grain growth and defect annihilation in block copolymers [J].

Dai, HJ ;

Balsara, NP ;

Garetz, BA ;

Newstein, MC .

PHYSICAL REVIEW LETTERS, 1996, 77 (17) :3677-3680

[9] Dynamics of block copolymers: Theory and experiment [J].

Fredrickson, GH ;

Bates, FS .

ANNUAL REVIEW OF MATERIALS SCIENCE, 1996, 26 :501-550

[10] Layer by layer imaging of diblock copolymer films with a scanning electron microscope [J].

Harrison, C ;

Park, M ;

Chaikin, PM ;

Register, RA ;

Adamson, DH ;

Yao, N .

POLYMER, 1998, 39 (13) :2733-2744