NiTi shape memory alloy thin films deposited by co-evaporation

被引：19

作者：

Adams, TM ^{[1
]}

Kirkpatrick, SR ^{[1
]}

Wang, Z ^{[1
]}

Siahmakoun, A ^{[1
]}

机构：

[1] Rose Hulman Inst Technol, MEMS & Microfabricat Lab, Terre Haute, IN 47803 USA

来源：

MATERIALS LETTERS | 2005年 / 59卷 / 10期

关键词：

shape memory materials; MEMS; deposition; thin films; heat engine; co-evaporation;

D O I：

10.1016/j.matlet.2004.12.019

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

NiTi shape memory alloy thin films from separate evaporation sources are produced. One micron films with a gradient of Ni-Ti ratios are fabricated at temperatures of 200 degrees C with a deposition rate of 8.3 angstrom/s. A single e-beam evaporation system combined with a thermal evaporation source is used to create a co-evaporation process. The evaporation rate of the nickel in the evaporation source is allowed to develop a steady state, and then the e-beam evaporation of the titanium is controlled to maintain the correct rate and desired ratio. The resulting thin films that exhibit the two-way shape memory effect had approximately a 50% concentration of titanium as measured by energy dispersive spectroscopy (EDS). (C) 2004 Elsevier B.V All rights reserved.

引用

页码：1161 / 1164

页数：4

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