Deposition kinetics of nanocolloidal gold particles

被引:29
作者
Brouwer, EAM [1 ]
Kooij, ES [1 ]
Hakbijl, M [1 ]
Wormeester, H [1 ]
Poelsema, B [1 ]
机构
[1] Univ Twente, MESA, Inst Nanotechnol, NL-7500 AE Enschede, Netherlands
关键词
nanocolloidal gold particles; deposition kinetics; ionic strength; RSA;
D O I
10.1016/j.colsurfa.2005.06.051
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The deposition kinetics of the irreversible adsorption of citrate-stabilized, nanocolloidal gold particles on Si/SiO2 surfaces, derivatized with (aminopropyl)triethoxysilane (APTES), is investigated in situ using single wavelength optical reflectometry. A well-defined flow of colloids towards the surface is realized using a radial impinging jet cell geometry. The dynamics of the deposition process is at first mass transport limited. Surface blocking effects determine the adsorption kinetics in the final stage. The entire deposition process can be adequately described in terms of a generalized adsorption theory, which combines the effects of mass-transport and the actual adsorption onto the surface. The diffusion coefficient of the particles is calculated from the initial deposition rate. The obtained value corresponds well with data obtained from experiments described in literature and with the value calculated from the Stokes-Einstein relation. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:133 / 138
页数:6
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