Cleaning of contaminated XUV-optics at BESSY II

被引：21

作者：

Eggenstein, F ^{[1
]}

Senf, F ^{[1
]}

Zeschke, T ^{[1
]}

Gudat, W ^{[1
]}

机构：

[1] BESSY GmbH, D-12489 Berlin, Germany

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 2001年 / 467卷

关键词：

carbon contamination; plasma discharge; synchrotron radiation;

D O I：

10.1016/S0168-9002(01)00312-6

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Carbon contaminations as observed on XUV-optics can be removed by an in situ plasma discharge process. The method developed at BESSY is based on waterfree oxygen/argon mixture and avoids water contamination of the UHV-equipment. The radio frequency based plasma cleaning method has been used at several undulator beamlines at BESSY II with a gain in flux at the carbon K-edge, At the UE56-I-plane grating monochromator, a gain in flux up to a factor 20 is observed. No loss in flux has been observed across the whole energy ranges of the "cleaned" beamlines. (C) 2001 Published by Elsevier Science B.V.

引用

页码：325 / 328

页数：4