Recent advances in the Sandia EUV 10x microstepper

被引：18

作者：

Goldsmith, JEM ^{[1
]}

Barr, PK ^{[1
]}

Berger, KW ^{[1
]}

Bernardez, LJ ^{[1
]}

Cardinale, GF ^{[1
]}

Darnold, JR ^{[1
]}

Folk, DR ^{[1
]}

Haney, SJ ^{[1
]}

Henderson, CC ^{[1
]}

Jefferson, KL ^{[1
]}

Krenz, KD ^{[1
]}

Kubiak, GD ^{[1
]}

Nissen, RP ^{[1
]}

O'Connell, DJ ^{[1
]}

Perras, YE ^{[1
]}

Ray-Chaudhuri, AK ^{[1
]}

Smith, TG ^{[1
]}

Stulen, RH ^{[1
]}

Tichenor, DA ^{[1
]}

Berkmoes, AAV ^{[1
]}

Wronosky, JB ^{[1
]}

机构：

[1] Sandia Natl Labs, Livermore, CA 94551 USA

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES II | 1998年 / 3331卷

关键词：

EUV; extreme ultraviolet; lithography; microlithography; stepper; microstepper;

D O I：

10.1117/12.309570

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The Sandia EUV 10x microstepper system is the result of an evolutionary development process, starting with a simple 20x system, progressing through an earlier 10x system, to the current system that has full microstepper capabilities. The 10x microstepper prints 400-mu m-diameter fields at sub-0.10-mu m resolution. Upgrades include the replacement of the copper wire target (used in the previous generation of laser-produced plasma source) with a pulsed xenon jet target, construction of an improved projection optics system, the addition of a dose monitor and an aerial image monitor, and the addition of a graphical user interface to the system operation software. This paper provides an up-to-date report on the status of the microstepper.

引用

页码：11 / 19

页数：9