Field emission site densities of nanostructured carbon films deposited by a cathodic arc

被引：32

作者：

Cui, JB ^{[1
]}

Robertson, J ^{[1
]}

Milne, WI ^{[1
]}

机构：

[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England

来源：

JOURNAL OF APPLIED PHYSICS | 2001年 / 89卷 / 10期

关键词：

D O I：

10.1063/1.1367317

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The field emission properties of nanostructured carbon films deposited by cathodic vacuum arc have been investigated by measuring both the emission currents and the emission site density. The films have an onset field of 3 V/mum. The emission site density is viewed on a phosphor anode and it increases rapidly with applied field. It is assumed that the emission occurs from surface regions with a range of field enhancement factors but with a constant work function. The field enhancement factor is found to have an exponential distribution. (C) 2001 American Institute of Physics.

引用

页码：5707 / 5711

页数：5

共 32 条

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