Structural characteristics of RF-sputtered BaTiO3 thin films

被引:28
作者
Preda, L
Courselle, L
Despax, B
Bandet, J
Ianculescu, A
机构
[1] Univ Toulouse 3, CNRS, UMR 5003, LGET,Lab Genie Elect, F-31062 Toulouse, France
[2] Univ Politehn Bucuresti, Dept Math & Phys, Bucharest 77206, Romania
[3] Univ Toulouse 3, CNRS, UMR 5477, LPST,Lab Phys Solides, F-31062 Toulouse, France
[4] Univ Politehn Bucuresti, Dept Mat Sci & Engn, Bucharest, Romania
关键词
infrared spectroscopy; Raman scattering; sputtering;
D O I
10.1016/S0040-6090(01)00885-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work some structural characteristics of the thin films deposited by a radio frequency-magnetron sputtering technique from a hot pressed BaTiO3 ceramic target were studied. The Ba/Ti ratio was measured by means of X-ray fluorescence in order to determine the real chemical composition of the films. The results showed that this ratio varied along the radial axis of the discharge. Besides, the evolution in phase composition of the annealed films as a function of the thermal treatment conditions (temperature and plateau) as well as the structural characteristics (unit cell parameter and crystallite size) were investigated by X-ray diffraction (XRD). Infrared (IR) and Raman spectroscopies were used in order to obtain more details about the distorted structure of such fine-grained thin films. In the case of these films, Raman spectroscopy carried out from 99 to 473 K did not emphasize steep, distinct transitions between the different polycrystalline BaTiO3 forms when compared with the bulk BaTiO3. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:43 / 50
页数:8
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