Improvement of GMR characteristics in [Ni81Fe19/Cu] multilayers by interfacial modulation technique using Kr ions

被引：1

作者：

Miyamoto, Y ^{[1
]}

Watanabe, K ^{[1
]}

Nishimura, K ^{[1
]}

Nakagawa, S ^{[1
]}

Naoe, M ^{[1
]}

机构：

[1] Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1998年 / 34卷 / 04期

关键词：

dual ion beam sputtering; giant magnetoresistance; Interfacial modulation technique; Kr ions;

D O I：

10.1109/20.706312

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Ni81Fe19/Cu multilayers with giant-magnetoresistive effect were deposited by dual ion beam sputtering method. Interfacial modulation technique using Ar or Kr ion bombardment to the interfaces of Ni-Fe/Cu multilayers could change the interfacial conditions, such as sharp interface, local mixing and interfacial diffusion. Kr was used as sputtering gas to reduce the damage of growing films by recoiled particles. The effect of Kr ion bombardment to the interfaces at restricted acceleration voltage of 100 V and reduction of residual stress seems to be effective for decreasing the film resistivity and increasing the MR ratio up to 17.8 % at room temperature.

引用

页码：921 / 923

页数：3

共 4 条

[1] QUANTITATIVE INTERPRETATION OF GIANT MAGNETORESISTANCE PROPERTIES OF PERMALLOY-BASED SPIN-VALVE STRUCTURES [J].