X-ray photoelectron spectroscopy study of β-BaB2O4 optical surface

被引：38

作者：

Atuchin, VV

Kesler, VG

Kokh, AE

Pokrovsky, LD

机构：

[1] Inst Semicond Phys, Novosibirsk 630090, Russia

[2] Inst Mineral & Petrog, Novosibirsk 630090, Russia

来源：

APPLIED SURFACE SCIENCE | 2004年 / 223卷 / 04期

关键词：

atomic force microscopy; reflection high-energy electron diffraction (RHEED); X-ray photoelectron spectroscopy; etching; sputtering; alkaline earth metals; boron; single crystal surface;

D O I：

10.1016/j.apsusc.2003.09.023

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

An X-ray photoelectron spectroscopy (XPS) study has been performed for (0 0 1) BaB2O4. The crystal surface has been polished mechanicaIly and cleaned by chemical etching. In XPS observation, depth profiling has been produced by sputtering with Ar+ 3 keV ions. Photoelectron binding energies of original element core levels and valence band have been measured as a function of sputtering time. The persistence of binding energies of barium and boron core levels and valence band structure has been found. For O 1 s core level. the formation of new spectral components with lower binding energies has been revealed. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：352 / 360

页数：9

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