Small pulsed electron-ion sources for radiation technologies and surface modification of materials

被引：9

作者：

Korenev, SA ^{[1
]}

Perry, AJ ^{[1
]}

机构：

[1] ISM TECHNOL INC,SAN DIEGO,CA 92131

来源：

VACUUM | 1996年 / 47卷 / 09期

关键词：

D O I：

10.1016/0042-207X(96)00133-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A new type of small, combined pulsed electron-ion source for radiation technologies and surface modification of materials is reported. The source consists of a high voltage generator and particle emitter in the form of a vacuum diode. Explosive electron emission is used for production of electron beams and explosive ion emission for production of ion beams. The main parameters are the source output are: kinetic energy 200-700 keV, pulse length 0.3-1.0 mu s, electron beam current 0.5-6 kA, ion beam current 0.1-200 A for ions of various conducting materials. The main applications of the device are presented. Copyright (C) 1996 Elsevier Science Ltd.

引用

页码：1089 / 1092

页数：4

共 10 条

[1] METAL-ION IMPLANTATION FOR LARGE-SCALE SURFACE MODIFICATION [J].

BROWN, IG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04) :1480-1485

[2]

DIDENKO A, 1987, EFFECTS PARTICLES BE

[3] PULSED ION SOURCES FOR SURFACE MODIFICATION OF MATERIALS [J].

KORENEV, S .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 80-1 (pt 2) :242-245

[4]

KORENEV SA, 1994, THESIS DUBNA

[5]

KORENEV SA, 1994, REV SCI INSTRUM, V36, P147

[6]

KORENEV SA, 1989, P 3 INT C EN PULS PA, P448

[7]

MESYATS G, 1986, ELECT BEAMS TECHNOLO

[8]

REMNEV GE, 1992, P 9 INT C BEAMS 92 W, V5

[9]

STINNETT RW, 1994, MATER RES SOC SYMP P, V316, P521

[10]

TREGLIO JR, 1994, SURF COAT TECH, V65, P144

← 1 →