A multi-technique investigation of TiO2 films prepared by magnetron sputtering

被引：14

作者：

Casu, M. B. ^{[1
]}

Braun, W. ^{[2
]}

Bauchspiess, K. R. ^{[1
]}

Kera, S. ^{[1
]}

Megner, B. ^{[1
]}

Heske, C. ^{[3
]}

Thull, R. ^{[2
]}

Umbach, E. ^{[1
]}

机构：

[1] Univ Wurzburg, D-97074 Wurzburg, Germany

[2] Univ Wurzburg, Dept Funct Mat Med & Dent, D-97070 Wurzburg, Germany

[3] Univ Nevada, Dept Chem, Las Vegas, NV 89154 USA

来源：

SURFACE SCIENCE | 2008年 / 602卷 / 08期

关键词：

magnetron sputtering; titanium dioxide; thin film structures; NEXAFS; XPS; XRD;

D O I：

10.1016/j.susc.2008.02.030

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have investigated seven samples of radio frequency magnetron-sputtered TiO2 thin films by using near-edge X-ray absorption fine structure (NEXAFS) spectroscopy, X-ray photoelectron spectroscopy (XPS), and X-ray diffraction (XRD). A detailed analysis of the Ti 2p and O 1s NEXAFS edges allows determining the degree of order and the polymorphs of the investigated samples. We have found that thin films grown by using a Ti target and lower deposition rates have a rutile character, while, by using a TiO2 target and higher deposition rates, amorphous/mixed thin films are obtained. We have also found that this correlation between phase and preparation conditions is perfectly reproducible leading to films with equal characteristics for the same preparation conditions. The NEXAFS results are supported by complementary XRD results. (c) 2008 Elsevier B.V. All rights reserved.

引用

页码：1599 / 1606

页数：8

共 27 条

[1] ELECTRON-ENERGY LOSS AND X-RAY ABSORPTION-SPECTROSCOPY OF RUTILE AND ANATASE - A TEST OF STRUCTURAL SENSITIVITY [J].