Photopolymerization by evanescent waves: characterization of photopolymerizable formulation for photolithography with nanometric resolution

被引：14

作者：

Espanet, A ^{[1
]}

Dos Santos, G ^{[1
]}

Ecoffet, C ^{[1
]}

Lougnot, DJ ^{[1
]}

机构：

[1] ENSCMU, CNRS, UMR 7525, Dept Photochim Gen, F-68093 Mulhouse, France

来源：

APPLIED SURFACE SCIENCE | 1999年 / 138卷

关键词：

thin films; photopolymers; evanescent waves; microparts fabrication; photolithography;

D O I：

10.1016/S0169-4332(98)00388-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have recently introduced a photolithography process using photopolymerization by evanescent waves (PEW) which is specially suitable for the fabrication of very thin films and parts of polymers (from few nanometers to 1 mu m). In this work, the response of formulations with various concentrations of amine cosynergist is examined in terms of time/intensity reciprocity. (C) 1999 Published by Elsevier Science B.V. All rights reserved.

引用

页码：87 / 92

页数：6

共 10 条

[1]

Allen N.S., 1989, PHOTOPOLYMERISATION

[2] NONCONVENTIONAL TECHNIQUES FOR OPTICAL LITHOGRAPHY [J].

DANDLIKER, R ;

GRAY, S ;

CLUBE, F ;

HERZIG, HP ;

VOLKEL, R .

MICROELECTRONIC ENGINEERING, 1995, 27 (1-4) :205-211

[3] KINETIC APPROACH OF O-2 INHIBITION IN ULTRAVIOLET-INDUCED AND LASER-INDUCED POLYMERIZATIONS [J].

DECKER, C ;

JENKINS, AD .

MACROMOLECULES, 1985, 18 (06) :1241-1244

[4]

Ecoffet C, 1998, ADV MATER, V10, P411, DOI 10.1002/(SICI)1521-4095(199803)10:5<411::AID-ADMA411>3.3.CO

[5]

2-G

[6]

ESPANET A, UNPUB J POLYM SCI

[7]

FOUASSIER JP, 1991, MAKROMOL CHEM, V192, P245

[8]

HARRICK NJ, 1967, INTRNAL REFLECTION S

[9]

Lougnot D. J., 1992, Pure and Applied Optics, V1, P251, DOI 10.1088/0963-9659/1/5/002

[10]

LOUGNOT DJ, 1995, PHOTOPOLYMERES TECHN

← 1 →