Surface nitridation of titanium metal by means of a gas tunnel type plasma jet

被引：22

作者：

Kobayashi, A

机构：

[1] Welding Research Institute, Osaka University, Ibaraki

来源：

JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE | 1996年 / 5卷 / 03期

关键词：

gas tunnel type plasma jet; plasma coatings; surface modification; titanium; titanium nitride coatings;

D O I：

10.1007/BF02649339

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The surface nitridation of titanium was carried out at a low pressure in nitrogen atmosphere using a gas tunnel type plasma jet. The titanium nitride (TiN) film, 10 mu m thick and 2000 HV, could be formed in 10 s. The structure of the TiN film was investigated by XRD. The Vickers hardness on the surface of the film was measured, The effects of deposition conditions on the properties of TIN films (TIN thickness, Vickers hardness, etc.) were investigated, and the advantage of this deposition method was identified from those results.

引用

页码：373 / 380

页数：8

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