共 34 条
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- [4] Mechanism for anisotropic etching of photoresist-masked, polycrystalline silicon in HBr plasmas [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (01): : 85 - 90
- [6] Studies of the low-pressure inductively-coupled plasma etching for a larger area wafer using plasma modeling and Langmuir probe [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (01): : 100 - 107
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- [9] MEASUREMENTS OF RADICAL DENSITIES IN RADIOFREQUENCY FLUOROCARBON PLASMAS USING INFRARED-ABSORPTION SPECTROSCOPY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (06): : 3102 - 3108
- [10] SIDEWALL PASSIVATION DURING THE ETCHING OF POLY-SI IN AN ELECTRON-CYCLOTRON-RESONANCE PLASMA OF HBR [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (01): : 96 - 101