Chemical sensors based on dielectric response of functionalized mesoporous silica films

被引：44

作者：

Domansky, K ^{[1
]}

Liu, J ^{[1
]}

Wang, LQ ^{[1
]}

Engelhard, MH ^{[1
]}

Baskaran, S ^{[1
]}

机构：

[1] Pacific NW Natl Lab, Richland, WA 99352 USA

来源：

JOURNAL OF MATERIALS RESEARCH | 2001年 / 16卷 / 10期

关键词：

D O I：

10.1557/JMR.2001.0387

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Dielectric response of mesoporous silica films was monitored as a function of several gas-phase chemical species. The effects of humidity, ammonia, and methane on dielectric constant and dissipation factor of films subjected to different chemical treatments are described. Dielectric constant and dissipation factor of partially dehydroxylated films were found to be highly sensitive to both water vapor and ammonia in air. The capacitive devices based on mesoporous silica films show potential for use in chemical sensors.

引用

页码：2810 / 2816

页数：7

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