Fluorine-contained films with high water-repellency and transparency prepared by RF plasma-enhanced CVD

被引：25

作者：

Hozumi, A

Kakinoki, N

Asai, Y

Takai, O

机构：

[1] Department of Materials Processing Engineering, School of Engineering, Nagoya University, Chikusa-ku

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 1996年 / 15卷 / 08期

关键词：

D O I：

10.1007/BF00264110

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：675 / 677

页数：3

共 10 条

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