A closed loop controller for electron-beam evaporators

被引：8

作者：

Band, A ^{[1
]}

Stroscio, JA ^{[1
]}

机构：

[1] NIST,ELECTRON PHYS GRP,GAITHERSBURG,MD 20899

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1996年 / 67卷 / 06期

关键词：

D O I：

10.1063/1.1147049

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A simple instrument for automatically controlling the deposition rate of an electron-beam evaporator is described. The design incorporates a commercially available, microprocessor based, proportional-integral-differential process controller that provides loop control and automatic determination of optimal proportional, integral, and differential loop constants. A logarithmic amplifier is used to linearize the overall loop response. The controller is used in conjunction with a compact electron-beam heated evaporator.

引用

页码：2366 / 2369

页数：4

共 5 条

[1]

Ashcroft N. W., 1976, SOLID STATE PHYS, P362

[2] SIMPLE, CALIBRATED DEPOSITION MONITOR INCORPORATED INTO AN ELECTRON-BEAM EVAPORATOR [J].