IR laser-induced decomposition of hexamethyldisiloxane for chemical vapour deposition of nano-structured hydrido(methyl)silicone powders

被引：11

作者：

Kupcík, J

Bastl, Z

Subrt, J

Pola, J

Papadimitriou, VC

Prosmitis, AV

Papagiannakopoulos, P

机构：

[1] Acad Sci Czech Republ, Inst Chem Proc Fundamentals, CR-16502 Prague 6, Czech Republic

[2] Acad Sci Czech Republ, J Heyrovsky Inst Phys Chem, CR-18223 Prague, Czech Republic

[3] Acad Sci Czech Republ, Inst Inorgan Chem, Rez 25086, Czech Republic

[4] Univ Crete, Heraklion 71409, Crete, Greece

来源：

JOURNAL OF ANALYTICAL AND APPLIED PYROLYSIS | 2001年 / 57卷 / 01期

关键词：

laser induced decomposition; chemical vapour deposition; hexamethyldisiloxane; hydrido(methyl)silicone; pyrolysis;

D O I：

10.1016/S0165-2370(00)00109-1

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

The infrared laser-induced decomposition of hexamethyldisiloxane with high-fluence laser pulses affords gaseous C-1-C-2 hydrocarbons, dimethylsilane and trimethylsilane, all of which confirm a multitude of decomposition steps involving cleavage of the strong Si-O bond. The process carried out in the absence or presence of hydrogen affords chemical vapour deposition of solid nano-structured hydrido(methyl)silicone powders and represents the first thermal access to these materials from peralkylated siloxane precursor. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：109 / 118

页数：10

共 18 条

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[2]

2-W

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