Short-focus silicon parabolic lenses for hard X-rays

被引：28

作者：

Aristov, VV ^{[1
]}

Starkov, VV ^{[1
]}

Shabel'nikov, LG ^{[1
]}

Kuznetsov, SM ^{[1
]}

Ushakova, AP ^{[1
]}

Grigoriev, MV ^{[1
]}

Tseitlin, VM ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Microelect Technol & High Pur Mat, Chernogolovka 142432, Moscow Dist, Russia

来源：

OPTICS COMMUNICATIONS | 1999年 / 161卷 / 4-6期

关键词：

X-ray; refraction; focusing; lens;

D O I：

10.1016/S0030-4018(99)00039-5

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Parabolic lenses have been formed by photoanodic etching of silicon in the form of profiles 22 mu m deep and 5 mu m in diameter. Observations with 17.46 keV radiation show that the focal length of the lenses is 7 cm and images with resolution of 3 mu m have been obtained. A procedure to evaluate the quality of real refracting profiles is suggested. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：203 / 208

页数：6

共 12 条

[1]

ARISTOV VV, 1998, SURFACE N, V11, P150

[2]

ELLEUME P, 1997, ESRF NEWSL, V28, P33

[3]

FOLL H, 1997, APPL PHYS A, V53, P8

[4] FORMATION MECHANISM AND PROPERTIES OF ELECTROCHEMICALLY ETCHED TRENCHES IN N-TYPE SILICON [J].

LEHMANN, V ;

FOLL, H .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (02) :653-659

[5]

MISHETTE A, 1986, OPTICAL SYSTEM SOFT

[6] Processing of three-dimensional microstructures using macroporous n-type silicon [J].

Ottow, S ;

Lehmann, V ;

Foll, H .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (01) :385-390

[7]

Pratt W.K., 1991, DIGITAL IMAGE PROCES

[8] Refractive lenses for high energy X-ray focusing [J].

Snigirev, A ;

Filseth, B ;

Elleaume, P ;

Klocke, T ;

Kohn, V ;

Lengeler, B ;

Snigireva, I ;

Souvorov, A ;

Tummler, J .

HIGH HEAT FLUX AND SYNCHROTRON RADIATION BEAMLINES, 1997, 3151 :164-170

[9] A compound refractive lens for focusing high-energy X-rays [J].

Snigirev, A ;

Kohn, V ;

Snigireva, I ;

Lengeler, B .

NATURE, 1996, 384 (6604) :49-51

[10]

STARKOV VV, 1998, SURFACE N, V11, P156

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