Perfluoroelastomer and fluoroelastomer seals for semiconductor wafer processing equipment

Parts made from fluorinated elastomers, e.g., Katrez(R) perfluoroelastomer parts, parts made from Viton(R) fluoroelastomer, are widely used as seals on semiconductor wafer processing equipment. Many of these seals are required to function in harsh chemical environments and at process temperatures ranging from 25 to 300 degreesC. Fluoroelastomers, including those of the perfluoroelastomer type, have extraordinary resistance to chemicals and heat, enabling them to withstand virtually any process media, including reactive plasmas, at temperatures as high as 316 degreesC. This paper is a review of perfluoroelastomers and fluoroelastomers used in semiconductor wafer processing. These seals offer cleanliness and lack of contamination while maintaining sealing functionality in aggressive media. Applications requiring resistance to both "wet" and "dry" process chemistry include etching, ashing, stripping, copper plating and chemical vapor deposition. Applications requiring thermal resistance include LPCVD, diffusion furnace and rapid thermal processing (RTP). A relative comparison of the various types of perfluoroelastomers used as well as a comparison to other elastomeric materials will also be discussed. (C) 2003 Elsevier Science B.V. All rights reserved.