Local lattice distortion in Si1-x-yGexCy epitaxial layers from x-ray absorption fine structure -: art. no. 045314

被引:10
作者
De Salvador, D
Tormen, M
Berti, M
Drigo, AV
Romanato, F
Boscherini, F
Stangl, J
Zerlauth, S
Bauer, G
Colombo, L
Mobilio, S
机构
[1] Univ Padua, Ist Nazl Fis Mat, I-35131 Padua, Italy
[2] Univ Padua, Dipartimento Fis G Galilei, I-35131 Padua, Italy
[3] Ist Nazl Fis Mat Tecnol Avanzate Superficie Catal, Lab Elettra Synchrotron, Trieste, Italy
[4] Univ Bologna, Ist Nazl Fis Mat, I-40127 Bologna, Italy
[5] Univ Bologna, Dipartimento Fis, I-40127 Bologna, Italy
[6] Johannes Kepler Univ Linz, Inst Halbleiterphys, A-4040 Linz, Austria
[7] Univ Cagliari, Ist Nazl Fis Mat, I-09042 Cagliari, Italy
[8] Univ Cagliari, Dipartimento Fis, I-09042 Cagliari, Italy
[9] Ist Nazl Fis Nucl, Lab Nazl Frascati, I-00044 Frascati, Italy
[10] Univ Roma Tre, Dipartimento Fis, I-00146 Rome, Italy
关键词
D O I
10.1103/PhysRevB.63.045314
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The local structure around Ge in an epitaxial him of Si1-x-yGexCy alloy is investigated by x-ray absorption fine structure. The interatomic distances and the Debye-Waller factors were determined as a function of the carbon concentration up to the third coordination shell. The most important effect of the introduction of C in the Si1-xGex matrix is the increase of static disorder with C concentration. This effect is larger for higher coordination shells. Molecular dynamics simulations show that this effect is due to the strong deformations induced by the small C atoms in the Si1-xGex matrix. The variation of interatomic distances as a function of C concentration and of the epitaxial strain is also discussed.
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页数:8
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